Ceramic Components for Lithography & Wafer Inspection
Perfect for next-generation lithography and wafer-handling applications, our ultra-pure ceramic components ensure minimal contamination and provide exceptionally long life performance.
LITHOGRAPHY & WAFER INSPECTION COMPONENTS
Resistant to chemical attack and thermally stable, our high-purity ceramic components are ideal for lithography processing, wafer handling (low contamination), and wafer inspection (extreme durability and hardness, dimensionally stable). Applications include:
Photomask substrates
Wafer chucks
Wafer stage components
Wafer tables
RECOMMENDED LITHOGRAPHY & WAFER INSPECTION MATERIALS
High-Purity Aluminas
UltraClean™ Recrystallized Silicon Carbide
CeraSiC, UltraSiC™ Direct Sintered Silicon Carbides
PHOTOMASK SUBSTRATES
CoorsTek photomask substrates are made from high-purity synthetic quartz glass to deliver superior UV and visible light transmittance, thermal stability, electrical insulation, low birefringence, and durable chemical stability. Advanced, scalable polishing technology makes these photomask substrates ideal for microscopic patterning from wafers to large flat panel displays (FPD).
Specifications : ceramic
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